Title of article :
Thermochemistry for silicic acid formation reaction: Prediction of new reaction pathway
Author/Authors :
Mondal، نويسنده , , Bhaskar and Ghosh، نويسنده , , Deepanwita and Das، نويسنده , , Abhijit K.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2009
Pages :
5
From page :
115
To page :
119
Abstract :
Reaction between SiO2 and water has been studied extensively using ab initio methods. The mechanism for formation of metasilicic acid SiO(OH)2 and orthosilicic acid Si(OH)4 has been explored and a new pathway for formation of Si(OH)4 is predicted. Heats of reaction ( Δ r H 298 ∘ ) and heats of formation ( Δ f H 298 ∘ ) at 298 K for the related reactions and species calculated at two different theoretical levels G3B3 and G3MP2B3 agree well with the literature values. It is found that when SiO2 reacts simultaneously with two water molecules, the thermodynamic as well as kinetic feasibility of the process is much greater than that when SiO2 reacts with one molecule of water.
Journal title :
Chemical Physics Letters
Serial Year :
2009
Journal title :
Chemical Physics Letters
Record number :
1927258
Link To Document :
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