Title of article :
Ti-doped AlN potential n-type ferromagnetic semiconductor: Density functional calculations
Author/Authors :
Fan، نويسنده , , S.W. and Yao، نويسنده , , K.L. and Huang، نويسنده , , Z.G. and Zhang، نويسنده , , J. and Gao، نويسنده , , G.Y. and Du، نويسنده , , G.H.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2009
Pages :
4
From page :
62
To page :
65
Abstract :
The magnetism and the electronic structures of Ti-doped AlN are studied by the first-principles calculations. It is found that Ti prefers to substitute Al site in AlN host, and this doped configuration favors the ferromagnetic ground state. The magnetic moment of the supercell containing single TiAl is 1.00 μB. Electronic structures suggest magnetic moments mainly come from the doped Ti atom, Ti-doped AlN is n-type ferromagnetic semiconductor and the ferromagnetism can be explained by double-exchange mechanism. For O and Ti co-doped AlN, calculations show ON defect would induce magnetic moments increasing and change Ti-doped AlN from semiconductor to metal.
Journal title :
Chemical Physics Letters
Serial Year :
2009
Journal title :
Chemical Physics Letters
Record number :
1927797
Link To Document :
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