Title of article :
Evidence of covalent bond formation at the silane–metal interface during plasma polymerization of bis-1,2-(triethoxysilyl)ethane (BTSE) on aluminium
Author/Authors :
Batan، نويسنده , , A. and Mine، نويسنده , , N. and Douhard، نويسنده , , B. and Brusciotti، نويسنده , , F. and De Graeve، نويسنده , , I. and Vereecken، نويسنده , , J. and Wenkin، نويسنده , , M. and Piens، نويسنده , , M. and Terryn، نويسنده , , H. and Pireaux، نويسنده , , J.J. and Reniers، نويسنده , , F.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2010
Pages :
6
From page :
107
To page :
112
Abstract :
Silane and silane-like films were deposited from bis-1,2-(triethoxysilyl)ethane by vacuum and atmospheric plasma onto aluminium. Time-of-flight secondary ion mass spectrometry (ToF-SIMS) was used for probing the aluminium/plasma polymer film interface. An AlOSi+ fragment was identified at nominal mass m/z = 70.9539 amu, indicating a strong chemical interaction (formation of a covalent bond) at the substrate/film interface. Until now, this strong silane–aluminium interaction has never been observed in plasma polymer BTSE films. tests in an ultrasonic water bath combined with X-ray photoelectron spectroscopy measurements allowed to indirectly confirm good adhesion, and therefore the formation of a chemical bond at the interface.
Keywords :
silane , BTSE , Plasma polymer films , XPS , TOF-SIMS
Journal title :
Chemical Physics Letters
Serial Year :
2010
Journal title :
Chemical Physics Letters
Record number :
1929286
Link To Document :
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