Title of article :
An ONIOM study of H2O interacting with the C-terminated surface of silicon carbide
Author/Authors :
Liu، نويسنده , , Yan and Su، نويسنده , , Kehe and Wang، نويسنده , , Xin and Wang، نويسنده , , Yanli and Zeng، نويسنده , , Qingfeng and Cheng، نويسنده , , Laifei and Zhang، نويسنده , , Litong، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2010
Pages :
6
From page :
87
To page :
92
Abstract :
A combined first principle and molecular mechanics research on the adsorption and surface reactions of H2O molecule with the C-terminated silicon carbide surface was carried out. The three-layered ONIOM(B3PW91/6-31g(d):AM1:UFF) approach on the (SiC)192·H2O model was examined. Three distinct adsorption styles (molecular adsorption, molecular hydrogen dissociation adsorption and the H–OH bond dissociative adsorption) and eight possible reaction channels were found. The results show that there are three competitive reactions over the eight channels and the H2O molecule is in favor of dissociating the H–OH bond by the absorptions on the adjacent surface atoms.
Journal title :
Chemical Physics Letters
Serial Year :
2010
Journal title :
Chemical Physics Letters
Record number :
1930507
Link To Document :
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