Author/Authors :
Lina and Borgstrِm، نويسنده , , Magnus T. and Wallentin، نويسنده , , Jesper and Kawaguchi، نويسنده , , Kenichi and Samuelson، نويسنده , , Lars and Deppert، نويسنده , , Knut، نويسنده ,
Abstract :
We report on the dynamics of in situ etching of nanowires using an etching agent which allows for parameter optimization for nanowire synthesis without concerns of tapering issues. Upon etching of InP nanowires using HCl it is found that HCl mainly reacts with the precursor TMI, its decomposition species, and physisorbed In. The reaction with solid InP is less rapid and diffusion limited. We find a gas-phase etch process which is metal assisted and has a high aspect ratio of 1:100.
