Author/Authors :
Wang، نويسنده , , Tsai-Te and Raghunath، نويسنده , , P. and Lu، نويسنده , , Yun-Fang and Liu، نويسنده , , Yu-Chang and Chiou، نويسنده , , Chwei-Huawn and Lin، نويسنده , , M.C.، نويسنده ,
Abstract :
We have studied the effect of InN deposited over TiO2 nanoparticle (NP) films on the performance of dye-sensitized solar cells (DSSCs) using N3 dye with I - / I 3 - electrolyte. A 10–20% increase in efficiency was observed for InN deposited, N3 sensitized 5–8.5 μm thick TiO2 films as compared to similar non-treated films. The deposition of InN was carried out in the temperature range of 573–723 K organometallic chemical vapor deposition (OMCVD). Spectral shifts and DFT calculations with a model anchoring group (R′COOH) both suggest binding of the N3 dye directly to both InN and the InN/TiO2 sites.
