Author/Authors :
Reznikova، نويسنده , , E.F and Prokhorova، نويسنده , , S.A and Basova، نويسنده , , T.V and Ajupov، نويسنده , , B.M and Nazʹmov، نويسنده , , V.P and Makarov، نويسنده , , O.A and Igumenov، نويسنده , , I.K and Krieger، نويسنده , , Ju.H، نويسنده ,
Abstract :
The influence of synchrotron radiation (SR) on vacuum-deposited layers of copper and aluminium phthalocyanines is investigated. For the creation of patterns in these layers X-ray radiation exposure and vacuum thermal development were used. It was established, that the layers of copper phthalocyanine (CuPc) possess the properties of both positive and negative vacuum X-ray resist upon radiation exposures of 5 kJ/cm3 and 35 kJ/cm3, respectively. The layers of aluminium phthalocyanine (AlPcX, where X = Cl, F, OH) possess the properties of only negative vacuum X-ray resists. The possibility of the creation of a submicron topology in layers of metal phthalocyanines has been demonstrated.
