Title of article :
On the research of a post-lens deflector for a submicrometer lithography system
Author/Authors :
Sheng Xia and Ding Shou-qian and Sun Jie، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1995
Abstract :
The paper presented investigates the relation between the third order deflection aberration and the struction parameters of the post-lens deflection system of EBLS. The design of the deflection coil can be accurately realized by the WEDM technique.
Journal title :
Nuclear Instruments and Methods in Physics Research Section A
Journal title :
Nuclear Instruments and Methods in Physics Research Section A
