Author/Authors :
Chen، نويسنده , , Jizhong and Imasaki، نويسنده , , Kazuo and Fujita، نويسنده , , Masayuki and Asakawa، نويسنده , , Makoto and Yamanaka، نويسنده , , Chiyoe and Mima، نويسنده , , Kunioki and Nakai، نويسنده , , Sadao، نويسنده ,
Abstract :
For soft X-ray projection lithography, we propose a 13 nm advanced SASE FEL with a quasi-stable optical klystron configuration. To shorten the wiggler length and decrease the overall size of the FEL system, we put forward the concept of quasi-stable operation of an asymmetric optical klystron. With a similar tolerance, our advanced SASE FEL can cut down the magnetic length of a single-pass SASE FEL from 37.12 to 20.3 m at the saturation power 42.8 MW (3D corrected), at the cost of an energy-modulated e-beam bunch and an adjustable dispersion magnet system. The detail analyses are based on the Pellegriniʹs scaling law and the one-dimensional FEL simulation code ILT1D.
