Author/Authors :
Artemiev، نويسنده , , A.N. and Bushev، نويسنده , , I.N. and Kolyasnikov، نويسنده , , V.A. and Kovachov، نويسنده , , G.A. and Latish، نويسنده , , O.E. and Martynenko، نويسنده , , V.V. and Moryakov، نويسنده , , V.P. and Nikitin، نويسنده , , B.I. and Odintsov، نويسنده , , D.G. and Peredkov، نويسنده , , S.S and Rakhimbabaev، نويسنده , , T.Y. and Stankevitch، نويسنده , , V.G. and Tzvid، نويسنده , , E.S. and Schmidt، نويسنده , , M. and Schmidt، نويسنده , , A. and Feiertag، نويسنده , , G.، نويسنده ,
Abstract :
A Deep X-ray Lithography (DXRL) beamline at the Kurchatov Synchrotron Radiation Source (KSRS) has been constructed and commissioned. For the irradiation a simple exposure apparatus and synchrotron radiation with a critical energy of about 7 keV was used. Samples with resist thickness of 300 μm and 500 μm have been exposed using a test mask. SEM results are shown.
