Greenfield، نويسنده , , D.E. and Korsakov، نويسنده , , V.S. and Mishachov، نويسنده , , V.I and Trutnev، نويسنده , , N.F.، نويسنده ,
Pages :
5
From page :
514
To page :
518
Abstract :
A depth control method in etching metal films for X-ray lithography masks is developed and experimentally confirmed. Possibilities of real-time end-point detection and applicability of this technique for automatic process control are demonstrated.
