Author/Authors :
Ovsyannikov، نويسنده , , V.P and Zschornack، نويسنده , , G، نويسنده ,
Abstract :
Strong focused electron beams produced by the magnetic field of an ECR ion source and a sequence of thin aluminum foils located in the ECR plasma chamber were used for a precision adjustment between the geometric axis of the ECR plasma chamber and the magnetic field of the source. After adjustment the acting radial component of the magnetic field on the source axis was not more than a few 10−4 T. The presented method allows it to optimize the ECR ion source construction and to create suppositions for an effective injection of additional electrons in ECR plasmas to increase the electron density inside the source plasma.