Author/Authors :
Mack، نويسنده , , V and Brom، نويسنده , , J.M and Fontaine، نويسنده , , J.C and Huss، نويسنده , , D and Schunck، نويسنده , , J.P and Zghiche، نويسنده , , A، نويسنده ,
Abstract :
We present some test results of microstrip gas chambers with boro-silicate glass substrates, which were coated before the photolithographic processing. We compare various coatings: sputtered S8900 glass and three coatings made by industrial companies (SURMET, VITO and ICMC). The composition and electrical properties of the different materials are discussed. Gain, current and rate capability are compared with those obtained from identical uncoated glass substrates.
