Feasibility study for double-sided silicon microstrip detector fabrication at IRST

This paper is concerned with the preliminary results of a technological study aimed at the development of a fabrication process for double-sided AC-coupled silicon microstrip detectors. The approach adopted for the fabrication of both single-sided and double-sided detectors is presented, and the results from electrical tests performed on detectors and test structures are reported and discussed. Good electrical characteristics as well as an acceptable number of process-related defects have been obtained for these prototype detectors, thus demonstrating the feasibility of fabricating such devices at the IRST facility.