• Title of article

    Study of high-dose X-ray radiation damage of silicon sensors

  • Author/Authors

    Klanner، نويسنده , , Robert and Fretwurst، نويسنده , , Eckhart and Pintilie، نويسنده , , Ioana and Schwandt، نويسنده , , Joern and Zhang، نويسنده , , Jiaguo، نويسنده ,

  • Pages
    5
  • From page
    117
  • To page
    121
  • Abstract
    The high intensity and high repetition rate of the European X-Ray Free-Electron Laser, presently under construction in Hamburg, will require pixel sensors which can stand X-ray doses up to 1 GGy for 3 years of operation. Within the AGIPD Collaboration the Hamburg group has systematically studied X-ray damage in silicon sensors for the dose range between 1 kGy and 1 GGy using strip sensors and test structures fabricated on high-ohmic n-type silicon from four different vendors. The densities of oxide charges, interface traps and surface current as function of dose and annealing conditions have been determined. The results have been implemented in TCAD simulations, and the radiation performance of strip sensors and guard-ring structures has been simulated and compared to experimental results. Finally, with the help of detailed TCAD simulations, the layout and technological parameters of the AGIPD pixel sensor have been optimized. It is found that the optimization for silicon sensors exposed to high X-ray doses is significantly different from that for non-irradiated sensors, and that the specifications of the AGIPD sensor can be met.
  • Keywords
    XFEL , Plasma effect , Silicon pixel sensor , sensor optimization , X-ray radiation damage
  • Journal title
    Astroparticle Physics
  • Record number

    2010334