Title of article
Experience with the UHV box coater and the evaporation procedure for VUV reflective coatings on the HADES RICH mirror
Author/Authors
Maier-Komor، نويسنده , , P. and Gernhنuser، نويسنده , , R. and Wieser، نويسنده , , J. and Ulrich، نويسنده , , A.، نويسنده ,
Pages
11
From page
152
To page
162
Abstract
An UHV box coater was set up for the deposition of highly reflective layers in the vacuum ultraviolet (VUV) wavelength range on large-area mirror substrates. The VUV mirrors are needed for the ring imaging Cherenkov (RICH) detector of the high-acceptance di-electron spectrometer (HADES). The complete dry vacuum system is described. The spatial deposition distribution from the evaporation sources was measured. The reflectivity of the Al mirror layer was optimized for the wavelength range of 145–210 nm by varying the thickness of the MgF2 protective layer. The setup for measuring the reflectivity in the VUV range is described and reflectivity data are presented.
Keywords
Electron beam evaporation , aluminum , Optical Measurements , Resistance heated source , Thickness by quartz crystal monitor , Surface roughness , Titanium , VUV reflectivity , Magnesium fluoride , RICH-detector
Journal title
Astroparticle Physics
Record number
2010430
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