Title of article :
Current and capacitance measurements as a fast diagnostic tool for evaluation of semiconductor parameters
Author/Authors :
Kemmer، نويسنده , , J. and Hauff، نويسنده , , IAIN D. and KRAUSE، نويسنده , , N. and Krieglmeyer، نويسنده , , Ch. and Yinxiang، نويسنده , , Yang، نويسنده ,
Pages :
9
From page :
199
To page :
207
Abstract :
A fast qualitative method is described for evaluation of semiconductor parameters by analyzing both the capacitance/voltage (C/V) and current/voltage (I/V) characteristics of pn- or Schottky-diodes, which are fabricated on the material under investigation. The method is applied for measurement of recombination and generation lifetimes of minority charge carriers and for determination of doping profiles and distribution of active generation/recombination (G/R) centers after irradiation with Am-alpha particles and deep phosphorus implantation. Measurements on epitaxial silicon result in doping profiles and distributions of active impurities within the epi-layer.
Keywords :
Doping profile , Defect distribution , Lifetime
Journal title :
Astroparticle Physics
Record number :
2010517
Link To Document :
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