Author/Authors :
Bulgakova، نويسنده , , S.A and Lopatin، نويسنده , , A.Ya and Luchin، نويسنده , , V.I and Mazanova، نويسنده , , L.M and Molodnjakov، نويسنده , , S.A and Salashchenko، نويسنده , , N.N، نويسنده ,
Abstract :
A number of poly(meth)acrylates positive resists of various chemical structures were synthesized and the sensitivity of 0.2 μm resists films to soft X-ray radiation of a laser plasma source at a wavelength of 13 nm was investigated. We found that the sensitivity of methylmethacrylate (MMA) copolymers depending on the nature of comonomers changes within the limits of 12.3–1.7 mJ/cm2 in a combination with the contrast γ=5.4–1.0. This sensitivity is higher than that of PMMA, which changes from 12 to 45 mJ/cm2 at the contrast γ=2.6–8.0 depending on the developer composition of methylethylketone (MEK)/isopropyl alcohol (IPA).
