Author/Authors :
Nazmov، نويسنده , , V.P and Mezentseva، نويسنده , , L.A and Pindyurin، نويسنده , , V.F and Petrov، نويسنده , , V.V and Yakovleva، نويسنده , , E.N، نويسنده ,
Abstract :
The possibility of manufacture of microstructures with high aspect ratio in industrial acrylic plastic by the method of deep X-ray lithography is investigated. A characteristic dependence of the rate of dissolution of the polymer on the dose of the radiation absorbed is obtained. Processing regimes for the formation of deep structures were selected. A model for computation of the profile of development of structures in view of large exhibition depth was suggested. 25×25 μm through channels were obtained in sheet acrylic plastic 1000 μm thick.
