Title of article :
A new method to correct deformations in emulsion using a precise photomask
Author/Authors :
Kimura، نويسنده , , M. M. I. Ishida، نويسنده , , H. and Shibuya، نويسنده , , H. and Ogawa، نويسنده , , S. and Matsuo، نويسنده , , T. and Fukushima، نويسنده , , C. and Takahashi، نويسنده , , G. and Kuge، نويسنده , , K. and Sato، نويسنده , , Y. and Tezuka، نويسنده , , I. and Mikado، نويسنده , , S.، نويسنده ,
Pages :
7
From page :
1
To page :
7
Abstract :
A new method to correct the emulsion deformation, mainly produced in the development process, is developed to recover the high accuracy of nuclear emulsion as a tracking device. The method is based on a precise photomask and a careful treatment of the emulsion films. A position measurement accuracy of 0.6 μ m is obtained over an area of 5 cm×7 cm. The method allows to measure positions of track segments with submicron accuracy in an ECC brick with as few as 10 reference tracks for alignment. Such a performance can be important for hybrid emulsion experiments at underground laboratories where only a small number of reference tracks for alignment are available.
Keywords :
Deformation , Photomask , Nuclear emulsion
Journal title :
Astroparticle Physics
Record number :
2012948
Link To Document :
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