Author/Authors :
Benbalagh، نويسنده , , Rabah and André، نويسنده , , Jean-Michel and Barchewitz، نويسنده , , Robert and Ravet، نويسنده , , Marie-Françoise and Raynal، نويسنده , , Alain and Delmotte، نويسنده , , Frank and Bridou، نويسنده , , Françoise and Julié، نويسنده , , Gwaénنelle and Bosseboeuf، نويسنده , , Alain and Laval، نويسنده , , René and Troussel، نويسنده , , Philippe، نويسنده ,
Abstract :
A new kind of xuv multilayer monochromator with a narrow spectral bandwidth is introduced. This monochromator is based on a Mo/Si multilayer mirror etched according to the profile of a lamellar grating. The fabrication of such a device involving multilayer deposition, UV lithography and reactive ion etching is presented. The monochromator has been characterized by means of the synchrotron radiation around the Si–L edge (100 eV). A reduction of the bandwidth has been observed with respect to the unpatterned mirror by a factor close to 3.
