Title of article :
Beam line BL11 for LIGA process at the NewSUBARU
Author/Authors :
Mekaru، نويسنده , , Harutaka and Utsumi، نويسنده , , Yuichi and Hattori، نويسنده , , Tadashi، نويسنده ,
Abstract :
A beam line BL11 is constructed for exposure Hard X-ray Lithography (HXL) in the LIGA (German acronym for Lithographite Galvanoformung and Abformung) process at the synchrotron radiation (SR) facility NewSUBARU of the Laboratory of Advanced Science and Technology for Industry (LASTI) in Himeji Institute of Technology (HIT). This beam line was designed by the criteria; photon energy range 4–6 keV, a beam spot size on the exposure stage ⩾60×5 mm2, a density of total irradiated photons ⩾1011 photons/cm2. The PMMA sheet etching was successfully demonstrated by using the output beam. We conclude that this beam line performs sufficiently well to study the exposure of HXL in the LIGA process.
Keywords :
Synchrotron radiation , HXL , LIGA , Micromachining , Multilayered-mirror , PMMA
Journal title :
Astroparticle Physics