Title of article
Effect of SR irradiation on crystallization of amorphous tin oxide film
Author/Authors
Kimura، نويسنده , , Y. and Kobayashi، نويسنده , , T. and Hanamoto، نويسنده , , K. and Sasaki، نويسنده , , M. and Kimura، نويسنده , , S. and Nakada، نويسنده , , T. and Nakayama، نويسنده , , Y. and Kaito، نويسنده , , C.، نويسنده ,
Pages
4
From page
1221
To page
1224
Abstract
In order to see the effect of SR irradiation on crystal growth, crystallization of tin oxide films has been performed in vacuum under SR irradiation. A thin amorphous tin oxide film 50 nm thick was prepared on the carbon substrate by vacuum evaporation of SnO2 power. A SnO crystal appeared between 450–500°C upon vacuum heating, with a preferred orientation of (0 0 1). By SR irradiation using a cylindrical mirror for 20 s, the SnO crystal appeared with the preferred orientation of (1 1 1). The crystal with the crystallographic shear structure was grown by SR irradiation. This growth under a SR beam is discussed in terms of SR beam excitation of lone-pair electrons seen in the SnO crystal structure.
Keywords
Crystallographic shear , crystallization , Irradiation , Amorphous thin film
Journal title
Astroparticle Physics
Record number
2016838
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