Title of article :
Photoluminescence properties of ZnTe homoepitaxial films deposited by synchrotron-radiation-excited growth
Author/Authors :
Nishio، نويسنده , , Mitsuhiro and Hayashida، نويسنده , , Kazuki and Harada، نويسنده , , Hiroki and Mitsuishi، نويسنده , , Yoshiaki and Guo، نويسنده , , Qixin and Ogawa، نويسنده , , Hiroshi، نويسنده ,
Pages :
4
From page :
1225
To page :
1228
Abstract :
ZnTe homoepitaxial films have been deposited at substrate temperatures between 27°C and 100°C by synchrotron-radiation-excited growth using diethylzinc and diethyltelluride. Effects of diethylzinc transport rate and substrate temperature upon the photoluminescence properties of the ZnTe films have been clarified. Strong deep level emissions centered at 1.85 and 2.1 eV related to defects such as vacancy-impurity complex become emerged with increasing diethylzinc transport rate or substrate temperature. A sharply excitonic emission at 2.375 eV associated with shallow acceptors is observed and neither a donor–acceptor pair recombination nor a deep level luminescence signal is detected in the spectrum of the film grown under the nearly stoichiometric condition, which indicates that ZnTe films of good quality can be grown even at room temperature by this growth technique.
Keywords :
Homoepitaxy , Synchrotron-radiation-excited growth , Low temperature growth , Photoluminescence property , ZnTe
Journal title :
Astroparticle Physics
Record number :
2016840
Link To Document :
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