Title of article
Deep X-ray lithography beamline at ELETTRA
Author/Authors
Pérennès، نويسنده , , F. and De Bona، نويسنده , , F. and Pantenburg، نويسنده , , F.J.، نويسنده ,
Pages
5
From page
1274
To page
1278
Abstract
A Deep X-Ray Lithography (DXRL) beamline was just commissioned at ELETTRA in Trieste, the Italian third generation synchrotron light source whose features make it well adapted to the DXRL process. A general description of the beamline is given with an emphasis on the reduction of the effect of secondary emission using a high energy filter based on an horizontal beam-stop. Finally the first fabricated microstructures are presented.
Keywords
Deep X-Ray lithography , Beam-stop
Journal title
Astroparticle Physics
Record number
2016859
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