Author/Authors :
Pérennès، نويسنده , , F. and De Bona، نويسنده , , F. and Pantenburg، نويسنده , , F.J.، نويسنده ,
Abstract :
A Deep X-Ray Lithography (DXRL) beamline was just commissioned at ELETTRA in Trieste, the Italian third generation synchrotron light source whose features make it well adapted to the DXRL process. A general description of the beamline is given with an emphasis on the reduction of the effect of secondary emission using a high energy filter based on an horizontal beam-stop. Finally the first fabricated microstructures are presented.
