Title of article :
Photodissociation thresholds of OH produced from CH3OH in solid neon and argon
Author/Authors :
Cheng، نويسنده , , Bing-Ming and Liu، نويسنده , , Chin-Ping and Lo، نويسنده , , Wen-Jui and Lee، نويسنده , , Yuan-Pern، نويسنده ,
Abstract :
Photodissociation thresholds of OH from CH3OH in solid Ne and Ar were determined via photolysis of CH3OH/Ne and CH3OH/Ar (1/200) samples in situ at 4 K. The samples were irradiated with VUV synchrotron radiation after dispersion by a Seya-Namioka monochromator. The OH photo-product was detected by means of laser-induced fluorescence technique. The increase of fluorescent intensity of OH was monitored and recorded after the matrix sample was irradiated at different wavelengths for 3–5 min. Photodissociation threshold energies of 7.13±0.02 eV (174.0±0.5 nm) and 7.08±0.04 eV (175.0±1.0 nm) were measured for OH production of CH3OH in solid Ne and Ar, respectively.
Keywords :
Methanol , Photodissociation threshold , Matrix isolation , Hydroxyl
Journal title :
Astroparticle Physics