Title of article
Development of in situ, at-wavelength metrology for soft X-ray nano-focusing
Author/Authors
Yuan، نويسنده , , Sheng and Yashchuk، نويسنده , , Valeriy V. and Goldberg، نويسنده , , Kenneth A. and Celestre، نويسنده , , Richard A. McKinney، نويسنده , , Wayne R. and Morrison، نويسنده , , Gregory Y. and Warwick، نويسنده , , Tony and Padmore، نويسنده , , Howard A.، نويسنده ,
Pages
3
From page
160
To page
162
Abstract
At the Advanced Light Source (ALS), we are developing broadly applicable, high-accuracy, in situ, at-wavelength wavefront slope measurement techniques for Kirkpatrick–Baez (KB) mirror nano-focusing. We describe here details of the metrology beamline endstation, the at-wavelength tests, and an original alignment method that have already allowed us to precisely set a bendable KB mirror to achieve a FWHM focused spot size of ∼120 nm, at 1 nm soft X-ray wavelength.
Keywords
X-Ray , Synchrotron radiation , Optical slope metrology , Long trace profiler , KB mirror , Metrology , Wavefront measurements
Journal title
Astroparticle Physics
Record number
2017110
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