Hard X-ray nano-focusing with Montel mirror optics

Kirkpatrick–Baez mirrors in the Montel (or nested) configuration were tested for hard X-ray nanoscale focusing at a third generation synchrotron beamline. In this scheme, two mirrors, mounted side-by-side and perpendicular to each other, provide for a more compact focusing system and a much higher demagnification and flux than the traditional sequential K–B mirror arrangement. They can accept up to a 120 μm×120 μm incident X-ray beam with a long working distance of 40 mm and broad-bandpass of energies up to ∼30 keV. Initial test demonstrated a focal spot of about 150 nm in both horizontal and vertical directions with either polychromatic or monochromatic beam. Montel mirror optics is important and very appealing for achromatic X-ray nanoscale focusing in conventional non-extra-long synchrotron beamlines.