Author/Authors :
Dalla Betta، نويسنده , , G.-F and Batignani، نويسنده , , G and Bettarini، نويسنده , , S and Boscardin، نويسنده , , M and Bosisio، نويسنده , , L and Carpinelli، نويسنده , , M and Dittongo، نويسنده , , S and Forti، نويسنده , , F and Giorgi، نويسنده , , M and Gregori، نويسنده , , P and Lusiani، نويسنده , , A and Manghisoni، نويسنده , , M and Pignatel، نويسنده , , G.U and Rama، نويسنده , , M and Ratti، نويسنده , , L and Re، نويسنده , , V and Sandr، نويسنده ,
Abstract :
We describe our experience on design and fabrication, on high-resistivity silicon substrates, of microstrip detectors and integrated electronics, devoted to high-energy physics experiments and medical/industrial imaging applications. We report on the full program of our collaboration, with particular regards to the tuning of a new fabrication process, allowing for the production of good quality transistors, while keeping under control the basic detector parameters, such as leakage current. Experimental results on JFET and bipolar transistors are presented, and a microstrip detector with an integrated JFET in source–follower configuration is introduced.
Keywords :
Silicon microstrip detectors , Fabrication technology , Field-effect devices , Bipolar transistors , Electrical characterisation