The production of CxHx−1 film using low pressure plasma CVD

In a practice experiment on ICF targets, a CH coating has been developed for the investigation of radiation-induced implosion. An ultra-high vacuum system has been constructed to coat CH layers. The system consists of a work chamber with ultimate vacuum of 5×10−6 Pa, a cleaning chamber with ultimate vacuum of 5×10−4 Pa, an RF generator of continuous power up to 300 W, and a “bounce-plate” with 60 small pits, in which micro-spheres are located. Using hydrogen and trans-2-butene as reaction gases, CH is coated onto plate and sphere targets, with thickness 5–20 μm and mean smoothness 50 nm. Different deposition conditions have been studied in detail with Fourier Transform infrared and X-ray photoelectron spectroscopy. The stable lifetime of the CxHx−1 film and the density of the surface dangling bonds under different H2 flow rates and different in-situ treatment time with H+ are described. An effective method of decreasing the surface dangling bond density is to use a long H+ treatment time in-situ.