Title of article
Optics developments in the VUV—soft X-ray spectral region
Author/Authors
Feigl، نويسنده , , T. and Heber، نويسنده , , Charles J. and Gatto، نويسنده , , A. and Kaiser، نويسنده , , N.، نويسنده ,
Pages
6
From page
351
To page
356
Abstract
The demand to enhance the optical resolution, to structure and observe ever smaller details, has pushed the search for technological innovations and improvements. Induced mainly by the production of more powerful electronic circuits with the aid of projection lithography, optics developments in recent years can be characterized by the use of electromagnetic radiation with smaller wavelength. This paper covers some theoretical considerations, material aspects, design and different techniques of controlled fabrication of multilayer coated optics. Their potential applications for microlithography as well as alternative application fields like microscopy, spectroscopy, soft X-ray lasers and free electron lasers are also discussed.
Keywords
VUV , EUV , Soft X-ray , microlithography , Multilayer optics
Journal title
Astroparticle Physics
Record number
2019191
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