Title of article :
Advances in anodic alumina MCP development
Author/Authors :
G. Drobychev، نويسنده , , Gleb and Barysevich، نويسنده , , Andrei and Delendik، نويسنده , , Kirill and Nédélec، نويسنده , , Patrick and Sillou، نويسنده , , Daniel and Voitik، نويسنده , , Olga، نويسنده ,
Pages :
3
From page :
246
To page :
248
Abstract :
The development of microchannel plates (MCP) on the basis of anodic aluminum oxide (AAO) started in the recent years. High electric resistivity of AAO up to several GΩ makes impossible to obtain an amplification of the electrons current. Several approaches to increase the electric conductivity of AAO were studied by the authors. One of these approaches was successful and new AAO samples present a resistance around tens of MΩ, which can vary in a wide range depending on the production parameters. An etching technology, which has a characteristic “anisotropy” due to the porous structure of the AAO, is developed in order to achieve AAO MCP with optimal operational aspect ratio (OAR). This technique allows the production of open-ended channels that keep a constant diameter along the full length of a plate.
Keywords :
Microchannel plate , Electron amplification
Journal title :
Astroparticle Physics
Record number :
2023075
Link To Document :
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