Title of article
Projection XEUV-nanolithography
Author/Authors
Chkhalo، نويسنده , , N.I. and Salashchenko، نويسنده , , N.N.، نويسنده ,
Pages
3
From page
147
To page
149
Abstract
A short review of present state of the art of projection photolithography is given. Progress and main problems of the EUV lithography have received primary consideration. Advantages of using synchrotrons as sources of EUV radiation in commercial EUV scanners are considered. Present state of the art of EUV lithography in Russia is reported.
Keywords
Synchrotron radiation , XEUV multilayer optics , Projection EUV lithography
Journal title
Astroparticle Physics
Record number
2026231
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