Title of article
Visualization of the development process in deep X-ray lithography
Author/Authors
Nazmov، نويسنده , , V. and Mohr، نويسنده , , J. and Reznikova، نويسنده , , E.، نويسنده ,
Pages
4
From page
153
To page
156
Abstract
In this work the contour visualization method of developed high aspect ratio microstructures with any lateral size of ∼1 μm in thick PMMA layers using normal and tilted SR exposure is proposed in order to investigate the microstructures behaviour and the development process. This method can be also applied in situ during the development process.
Keywords
X-ray exposure , Synchrotron radiation , High Aspect ratio , LIGA microstructures
Journal title
Astroparticle Physics
Record number
2026233
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