Title of article :
Visualization of the development process in deep X-ray lithography
Author/Authors :
Nazmov، نويسنده , , V. and Mohr، نويسنده , , J. and Reznikova، نويسنده , , E.، نويسنده ,
Abstract :
In this work the contour visualization method of developed high aspect ratio microstructures with any lateral size of ∼1 μm in thick PMMA layers using normal and tilted SR exposure is proposed in order to investigate the microstructures behaviour and the development process. This method can be also applied in situ during the development process.
Keywords :
X-ray exposure , Synchrotron radiation , High Aspect ratio , LIGA microstructures
Journal title :
Astroparticle Physics
