Title of article :
Fabrication of back-illuminated, fully depleted charge-coupled devices
Author/Authors :
Holland، نويسنده , , S.E and Dawson، نويسنده , , K.S. and Palaio، نويسنده , , N.P. and Saha، نويسنده , , J. and Roe، نويسنده , , N.A. and Wang، نويسنده , , G.، نويسنده ,
Pages :
5
From page :
653
To page :
657
Abstract :
We describe a fabrication strategy to produce fully depleted, back-illuminated charge-coupled devices (CCDs). Wafers are partially processed at a commercial foundry using standard processing techniques. The wafers are then thinned to the final desired thickness, and the processing steps necessary to produce back-illuminated devices are performed in our laboratory. The CCDs are then probed at wafer level, and we describe our techniques to screen for gate insulator flaws as well as defects on the back side of the wafer that are important for fully depleted devices.
Keywords :
Charge-coupled device , High-resistivity silicon , Fully depleted , Back illuminated , Fabrication techniques
Journal title :
Astroparticle Physics
Record number :
2029718
Link To Document :
بازگشت