Nano-dot markers for electron tomography formed by electron beam-induced deposition: Nanoparticle agglomerates application

A method allowing fabrication of nano-dot markers for electron tomography was developed using an electron beam-induced deposition in an ordinary dual beam instrument (FIB and SEM) or an SEM. The electron beam deposited nano-dot markers are suitable for automatic alignment of tomographic series. The accuracy of the alignment was evaluated and the method was demonstrated on agglomerated nanoparticle samples using a rod-shaped sample with no missing wedge effect. Simulations were used to assess the effect of marker size on alignment accuracy.