Determination of the height of a microstructure sample by a SEM with a conventional and a digital photogrammetric method

We describe two methods for the determination of the height of a microstructure sample using a scanning electron microscope. Measurements and model calculations concerning the distance between relevant edges have been carried out as a function of tilt angle for a special microsample. Representing practical cases of microstructure parameters the calculations show the range of applicability of this traditional method. The application of digital photogrammetry for the determination of microstructure dimensions is a new method to determine the height and generally the topography of microstructure objects. For a precise photogrammetric measurement we need some well-defined measuring points. Their image coordinates have to be determined. A nanomarker technique has been used for the creation of such measuring points. The results of the height determination in the conventional way agree approximately with that of the digital photogrammetric method. We achieved a precision of the height determination below 100 nm for both methods. Further improvements have to be implemented in order to automate the photogrammetric analysis procedure.