Chemical patterns of octadecyltrimethoxysilane monolayers for the selective deposition of nanoparticles on silicon substrate

The use of nano-objects to make the active part of reproducible nanodevices requires their controlled assembling on specific areas of substrates. s work, we propose to use van der Waals interactions to assemble selectively gold particles covered by alkyl-thiol ligands on hydrophobic OctadecylTriMethoxySilane (OTMS) patterns defined on SiO2/Si substrates by a process combining nano-imprint lithography (NIL) or high resolution electron beam lithography (HREBL) and atmospheric chemical vapor deposition (CVD) of silane. y by atomic force microscopy (AFM) reveals that homogeneous patterns of OTMS self-assembled monolayers, extending on several square millimeters, have been made. These OTMS patterns, with a lateral dimension ranging from 2 μm down to 50 nm, can be located at a precise place of a nanodevice, for example, between nanoelectrodes. Preliminary results of selective nanoparticle deposition on these chemical patterns are presented.