• Title of article

    Chemical vapour deposition of titanium carbide on WCCo cemented carbides

  • Author/Authors

    Bisch، نويسنده , , C. and Nadal، نويسنده , , M. and Teyssandier، نويسنده , , F. and Bancel، نويسنده , , M. and Vallon، نويسنده , , B.، نويسنده ,

  • Pages
    11
  • From page
    238
  • To page
    248
  • Abstract
    A study was undertaken to improve the surface properties of WCCo tips used for dynamic indentation. For that purpose, titanium carbide (TiC) coatings were produced by chemical vapour deposition. The optimization of the TiC deposition conditions together with a minimal thickness of the η-layer was obtained through a complete factorial experimental design by varying three parameters: the molar fraction of methane, the pre-carburization treatment, and the deposition time. Several mechanical characterizations were carried out on the TiC coatings as well as on the tips. The influence of the cobalt content of the substrate on the thickness of both the TiC and the η-layers was also investigated.
  • Keywords
    chemical vapor deposition , Titanium carbide , cemented carbide
  • Journal title
    Astroparticle Physics
  • Record number

    2049826