Title of article :
Chemical vapour deposition of titanium carbide on WCCo cemented carbides
Author/Authors :
Bisch، نويسنده , , C. and Nadal، نويسنده , , M. and Teyssandier، نويسنده , , F. and Bancel، نويسنده , , M. and Vallon، نويسنده , , B.، نويسنده ,
Pages :
11
From page :
238
To page :
248
Abstract :
A study was undertaken to improve the surface properties of WCCo tips used for dynamic indentation. For that purpose, titanium carbide (TiC) coatings were produced by chemical vapour deposition. The optimization of the TiC deposition conditions together with a minimal thickness of the η-layer was obtained through a complete factorial experimental design by varying three parameters: the molar fraction of methane, the pre-carburization treatment, and the deposition time. Several mechanical characterizations were carried out on the TiC coatings as well as on the tips. The influence of the cobalt content of the substrate on the thickness of both the TiC and the η-layers was also investigated.
Keywords :
chemical vapor deposition , Titanium carbide , cemented carbide
Journal title :
Astroparticle Physics
Record number :
2049826
Link To Document :
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