Title of article
Chemical vapour deposition of titanium carbide on WCCo cemented carbides
Author/Authors
Bisch، نويسنده , , C. and Nadal، نويسنده , , M. and Teyssandier، نويسنده , , F. and Bancel، نويسنده , , M. and Vallon، نويسنده , , B.، نويسنده ,
Pages
11
From page
238
To page
248
Abstract
A study was undertaken to improve the surface properties of WCCo tips used for dynamic indentation. For that purpose, titanium carbide (TiC) coatings were produced by chemical vapour deposition. The optimization of the TiC deposition conditions together with a minimal thickness of the η-layer was obtained through a complete factorial experimental design by varying three parameters: the molar fraction of methane, the pre-carburization treatment, and the deposition time. Several mechanical characterizations were carried out on the TiC coatings as well as on the tips. The influence of the cobalt content of the substrate on the thickness of both the TiC and the η-layers was also investigated.
Keywords
chemical vapor deposition , Titanium carbide , cemented carbide
Journal title
Astroparticle Physics
Record number
2049826
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