• Title of article

    Thermal stability of nanocrystalline Ni

  • Author/Authors

    Klement، نويسنده , , U. and Erb، نويسنده , , U. and El-Sherik، نويسنده , , A.M. and Aust، نويسنده , , K.T.، نويسنده ,

  • Pages
    10
  • From page
    177
  • To page
    186
  • Abstract
    Thermal stability of electroplated nanocrystalline Ni of 10 and 20 nm grain size was investigated by differential scanning calorimetry (DSC). The temperature dependence and heat release ΔH during grain growth have been determined by linear anisothermal measurements (linear heating at 10 K min−1). The corresponding change in microstructure has been monitored in the temperature range between 373 K and 693 K using transmission electron microscopy (TEM). The TEM and DSC studies identified three exothermic reactions: “nucleation” and abnormal grain growth (353–562 K), normal grain growth (562–593 K) and growth towards equilibrium (643–773 K). The grain growth behaviour, and the similar heat releases ΔH = 18 J g−1, and 16 J g−1 measured for the 10 nm and 20 nm Ni nanocrystals respectively in the DSC experiments may be related to the observed sulphur segregation at grain boundaries and triple junctions.
  • Keywords
    thermal stability , nickel , grain growth , microstructure
  • Journal title
    Astroparticle Physics
  • Record number

    2049868