Title of article :
Transmission electron microscopy at 20 kV for imaging and spectroscopy
Author/Authors :
Kaiser، نويسنده , , U. and Biskupek، نويسنده , , J. and Meyer، نويسنده , , J.C. and Leschner، نويسنده , , J. and Lechner، نويسنده , , L. and Rose، نويسنده , , H. and Stِger-Pollach، نويسنده , , M. and Khlobystov، نويسنده , , A.N. and Hartel، نويسنده , , P. and Müller، نويسنده , , H. and Haider، نويسنده , , M. and Eyhusen، نويسنده , , S. G. Benner، نويسنده , , G.، نويسنده ,
Pages :
8
From page :
1239
To page :
1246
Abstract :
The electron optical performance of a transmission electron microscope (TEM) is characterized for direct spatial imaging and spectroscopy using electrons with energies as low as 20 keV. The highly stable instrument is equipped with an electrostatic monochromator and a CS-corrector. At 20 kV it shows high image contrast even for single-layer graphene with a lattice transfer of 213 pm (tilted illumination). For 4 nm thick Si, the 200 reflections (271.5 pm) were directly transferred (axial illumination). We show at 20 kV that radiation-sensitive fullerenes (C60) within a carbon nanotube container withstand an about two orders of magnitude higher electron dose than at 80 kV. In spectroscopy mode, the monochromated low-energy electron beam enables the acquisition of EELS spectra up to very high energy losses with exceptionally low background noise. Using Si and Ge, we show that 20 kV TEM allows the determination of dielectric properties and narrow band gaps, which were not accessible by TEM so far. These very first results demonstrate that low kV TEM is an exciting new tool for determination of structural and electronic properties of different types of nano-materials.
Keywords :
eels , Low-voltage TEM , high resolution , Beam damage
Journal title :
Astroparticle Physics
Record number :
2050831
Link To Document :
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