Title of article
Microfabrication and characterization of gated amorphous diamond-based field emission electron sources
Author/Authors
Xu، نويسنده , , N.S and She، نويسنده , , J.C and Huq، نويسنده , , S.E. and CHEN، نويسنده , , Jian and Deng، نويسنده , , Sz-Hau Chen، نويسنده , , Jun، نويسنده ,
Pages
8
From page
111
To page
118
Abstract
Gated field emission electron sources of amorphous diamond (a-D) coated Si tips and a-D diodes on a rough Si substrate were studied, detailing the deposition and characterization of the thin film, the fabrication processes and the emission behavior of the electron sources. Mechanisms responsible for the emission process of the a-D coated devices are proposed. A comparison of the field emission performance of the two types of devices is presented. In addition, future improvements of the a-D diode on a rough Si cathode are discussed.
Keywords
Amorphous diamond , Gated electron source , electron field emission
Journal title
Astroparticle Physics
Record number
2051234
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