Title of article :
Plasticity enhancement mechanisms in MoSi2
Author/Authors :
Gibala، نويسنده , , R. and Chang، نويسنده , , H. and Czarnik، نويسنده , , C.M. and Campbell، نويسنده , , J.P.، نويسنده ,
Pages :
9
From page :
122
To page :
130
Abstract :
Low temperature plasticity enhancement mechanisms which are operative in body-centered cubic metals and B2 ordered alloys can be observed in MoSi2 in appropriate stress-temperature-strain rate regimes. We illustrate effects of surface films (ZrO2) and dispersoids (TiC) in enhancing plasticity of MoSi2 in the ductile-to-brittle transition range of temperatures, 900–1400°C. We also show, through experiments involving high temperature (1300°C) prestrain, that effective operation of dislocation generation processes can extend the low temperature range to which polycrystalline MoSi2 can be plastically deformed. The dislocation substructures of polycrystalline MoSi2 deformed over this temperature range have also been characterized. The overall results illustrate that approaches to enhance toughness of MoSi2 need not be limited to ductile phases characterized by weak interfaces.
Keywords :
Ductile phases , Surface films , Dispersoids , Weak interfaces
Journal title :
Astroparticle Physics
Record number :
2054383
Link To Document :
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