Title of article
Plasticity enhancement mechanisms in MoSi2
Author/Authors
Gibala، نويسنده , , R. and Chang، نويسنده , , H. and Czarnik، نويسنده , , C.M. and Campbell، نويسنده , , J.P.، نويسنده ,
Pages
9
From page
122
To page
130
Abstract
Low temperature plasticity enhancement mechanisms which are operative in body-centered cubic metals and B2 ordered alloys can be observed in MoSi2 in appropriate stress-temperature-strain rate regimes. We illustrate effects of surface films (ZrO2) and dispersoids (TiC) in enhancing plasticity of MoSi2 in the ductile-to-brittle transition range of temperatures, 900–1400°C. We also show, through experiments involving high temperature (1300°C) prestrain, that effective operation of dislocation generation processes can extend the low temperature range to which polycrystalline MoSi2 can be plastically deformed. The dislocation substructures of polycrystalline MoSi2 deformed over this temperature range have also been characterized. The overall results illustrate that approaches to enhance toughness of MoSi2 need not be limited to ductile phases characterized by weak interfaces.
Keywords
Ductile phases , Surface films , Dispersoids , Weak interfaces
Journal title
Astroparticle Physics
Record number
2054383
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