Title of article :
The influence of neon in the deposition of titanium nitride by plasma-assisted physical vapour deposition
Author/Authors :
Fancey، نويسنده , , KevinS. and Leyland، نويسنده , , Adrian and Moh’d Badow، نويسنده , , Fadhel and Matthews، نويسنده , , Allan، نويسنده ,
Abstract :
Titanium nitride coatings were produced by reactive (plasma-assisted) deposition in argon and neon-based nitrogenous discharges. Coating analysis has indicated that during deposition, nitrogen reactivity can be enhanced when neon is used, and this may be attributed to Penning ionisation. The effect could assist deposition onto heat-sensitive materials by permitting lower processing temperatures.
Keywords :
PVD , Titanium nitride , neon , Penning ionisation
Journal title :
Astroparticle Physics
