• Title of article

    Anodic behaviour of Al-refractory metal amorphous alloys

  • Author/Authors

    Wolowik، نويسنده , , A. and Janik-Czachor، نويسنده , , M.، نويسنده ,

  • Pages
    6
  • From page
    301
  • To page
    306
  • Abstract
    In order to understand the anodic behaviour of AlMo and AlW amorphous alloys in the borate buffer electrolyte, samples of these alloys were polarized galvanostatically. The resultant anodic films were thicker than the passive films formed during potentiodynamic polarization enabling detailed examination of the films and alloy substrates by surface analytical methods. AES investigations suggest that the anodic films formed at low and moderate voltages on AlMo or AlW amorphous alloys consist of Al-oxide, whereas refractory metals remain unoxidized and enriched at the film/substrate interface. Molybdenum and tungsten act as ‘dissolution moderators’, restraining the substrate dissolution process at the film/substrate interface. However, after anodization at high voltages (50 V), AES revealed the presence of an oxidized refractory metal in the inner part of the anodic film. Based on these results of growth of thick anodic films, the role of Mo and W in enhancing the pitting corrosion resistance is discussed.
  • Keywords
    Amorphous alloys , Sputter deposited alloys , Localized corrosion , Al-base alloys , passivity
  • Journal title
    Astroparticle Physics
  • Record number

    2054910