Title of article
In situ interface characterization of silicon surface in fluoride media
Author/Authors
Patel، نويسنده , , B.K. and Sahu، نويسنده , , S.N.، نويسنده ,
Pages
4
From page
914
To page
917
Abstract
The porous Si/HF-electrolyte junction has been studied by capacitance (C)–voltage (V) and current (I)–voltage (V) measurements. The observed current under forward bias shows an exponential increase like a Schottky diode with two oscillations around 1.0 and 2.4 V (SCE), respectively, whereas the reverse bias current shows negligible contribution. The low-frequency capacitance spectrum exhibits a peak structure in forward bias regime, which can be ascribed to the charge trapping/detrapping at Fermi level of porous Si under forward bias. The potential and charge distribution for a p-semiconductor/electrolyte junction is discussed
Keywords
Silicon interface , Fluoride media , Interface characterization
Journal title
Astroparticle Physics
Record number
2058429
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