Author/Authors :
Liu، نويسنده , , Zhongfan and Meng، نويسنده , , X.K. and Recktenwald، نويسنده , , T. and Mücklich، نويسنده , , F.، نويسنده ,
Abstract :
Laser interference patterns were used to structure Ni–Al thin films on silicon. Hard and soft properties were combined in the patterned surface in the form of dot- or line-array through local intermetallic reactions. WLI and AFM showed the topography of the structured sample; X-ray diffraction (XRD) and nano-indentation showed the intermetallic phase and its microhardness.
