Author/Authors :
Mathur، نويسنده , , M.S. and McKee، نويسنده , , J.S.C. and Liu، نويسنده , , M. and He، نويسنده , , D.، نويسنده ,
Abstract :
Surface damage caused in palladium and kapton by the implantation of 20 keV D2+ ions, fiuence- 1011 ions cm−2, has been investigated utilizing the technique of atomic force microscopy. TRIM program has been used to calculate the vacancies and interstitials created during implantation.
