Title of article :
A TiNiPd thin film microvalve for high temperature applications
Author/Authors :
Liu، نويسنده , , Y and Kohl، نويسنده , , M and Okutsu، نويسنده , , K and Miyazaki، نويسنده , , S، نويسنده ,
Pages :
5
From page :
205
To page :
209
Abstract :
A microvalve with high operation temperature ranging up to 120 °C is presented, which is driven by a TiNiPd thin film microactuator. Fabrication is based on a hybrid integration concept. The main fabrication technologies are magnetron sputtering, photochemical micromachining, and thin film transfer. Infrared microscopy investigations of temperature profiles and force-deflection tests are performed to determine optimum operation conditions of the TiNiPd microactuator. Gas flow measurements demonstrate control of pressure differences up to 70 kPa. The high phase transformation temperatures allow a cooling time of the microactuator of 22 ms at room temperature resulting in a maximum operation frequency of the microvalve of 30 Hz.
Keywords :
Smart materials , Pd) thin films , Microvalve , Ti(Ni , Shape memory actuator , Sputter deposition
Journal title :
Astroparticle Physics
Record number :
2064662
Link To Document :
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