• Title of article

    A TiNiPd thin film microvalve for high temperature applications

  • Author/Authors

    Liu، نويسنده , , Y and Kohl، نويسنده , , M and Okutsu، نويسنده , , K and Miyazaki، نويسنده , , S، نويسنده ,

  • Pages
    5
  • From page
    205
  • To page
    209
  • Abstract
    A microvalve with high operation temperature ranging up to 120 °C is presented, which is driven by a TiNiPd thin film microactuator. Fabrication is based on a hybrid integration concept. The main fabrication technologies are magnetron sputtering, photochemical micromachining, and thin film transfer. Infrared microscopy investigations of temperature profiles and force-deflection tests are performed to determine optimum operation conditions of the TiNiPd microactuator. Gas flow measurements demonstrate control of pressure differences up to 70 kPa. The high phase transformation temperatures allow a cooling time of the microactuator of 22 ms at room temperature resulting in a maximum operation frequency of the microvalve of 30 Hz.
  • Keywords
    Smart materials , Pd) thin films , Microvalve , Ti(Ni , Shape memory actuator , Sputter deposition
  • Journal title
    Astroparticle Physics
  • Record number

    2064662