Title of article :
Thin film diamond metal-insulator field effect transistor for high temperature applications
Author/Authors :
Pang، نويسنده , , Lisa Y.S. and Chan، نويسنده , , Simon S.M. and Chalker، نويسنده , , Paul R. and Johnston، نويسنده , , Colin and Jackman، نويسنده , , Richard B.، نويسنده ,
Pages :
5
From page :
124
To page :
128
Abstract :
bstract temperature depletion-mode metal-insulator field effect transistor (MISFET) has been fabricated from thin film polycrystalline diamond with a p-type (boron doped) channel and an insulating diamond gate. This device was successfully operated at 300 °C with low gate leakage currents, displaying pinch-off when in depletion and high levels of channel current modulation in enhancement. A transconductance value of 174 μS mm−1 has been measured, the highest reported value to date for this type of device.
Keywords :
Ohmic region , Pinch off , Schottky barrier
Journal title :
Astroparticle Physics
Record number :
2065123
Link To Document :
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